A team of researchers from ANSTO and University of Technology Sydney have set a record by conducting thin film experiments at 1,100 degrees Celsius, using the Spatz reflectometer equipped with a vacuum furnace.
The unique combination of neutron reflectometry with high temperature apparatus enables atomic-scale insights into thin film growth and diffusion processes. This is of relevance to a wide range of thin film technology and devices which undergo a range of processing and heat treatment conditions to optimize performance.
The UTS group, led by Francesca Iacopi and Aiswarya Pradeepkumar, has been studying the growth of thin carbon sheets (graphene) on SiC/Si substrates which occurs at high temperatures. This award-winning process allows for highly conductive electronics that can be integrated with standard silicon fabrication processes.
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